Intel has recently announced the installation of the world’s first commercial High NA EUV lithography machine, marking a pivotal advancement in chip manufacturing technology.
This machine, which cost approximately $350 million, is slated to commence process development later this year.
Mark Phillips, a key figure at Intel, indicated that the new High NA EUV technology would be tested on the 18A node for concept proofing and integrated into commercial production at the 14A node.
Intel anticipates that this technology will be viable for at least three future generations, potentially breaking the 1nm scale barrier.
Phillips also discussed the challenges associated with further reducing the wavelength below 6.7nm, such as the increased size of optical components.
Despite these challenges, he remains optimistic about continuing advancements in hyper-numerical aperture (Hyper NA) technologies.
Intel is also collaborating with EDA companies to develop chip “stitching” techniques, which would help overcome the limitations of smaller chip sizes achievable with High NA EUV technology.
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